With the latest expansion stage of its proven ELWIMAT measurement system, HOFBAUER OPTIK introduces the new ELWIMAT-VFS with an integrated laser interferometer.

In addition to the established methods for high-precision angle and position measurement, the system now also enables longitudinal position measurement in the nanometer range.

The new interferometer is based on a fiber-coupled laser source and is fully integrated into the existing ELWIMAT system architecture. This allows translational movements and length changes to be recorded directly and simultaneously with angular deviations - a decisive advantage when characterizing complex opto-mechanical systems.

The achievable measurement accuracy is in the range of 10 to 100 nm, depending on measuring distance and environmental conditions. Combined with precise recording of environmental parameters such as temperature, pressure, and humidity, the influence of the refractive index of air is specifically compensated, ensuring high absolute accuracy.

The ELWIMAT-VFS is designed in particular for applications in precision optics, precision mechanics, and machine calibration. Typical areas of application include the alignment and measurement of optical assemblies, the analysis of guideway accuracy, and the calibration of linear movements with maximum resolution.

Thanks to its modular architecture, the system can be configured flexibly, from single-axis systems to multi-channel measurement setups. The combination of angle- and length-resolving measurement technology in a single system opens up new possibilities for the comprehensive evaluation of form, position, and motion errors.

With the ELWIMAT-VFS, HOFBAUER OPTIK once again sets new standards in optical precision measurement technology, fully in line with the company motto:

Knowing the limit - pushing the limit.

Visit us at OPTATEC from May 5 to 7, 2026, and see the quality of the applications of this ingenious measurement concept for yourself.

Hall 3, Booth 503.